Megasonic Cleaner - List of Manufacturers, Suppliers, Companies and Products

Ultrasonic Megasonic Cleaning Device (Single Sheet Cleaning / Bath Tank Type Cleaning)

Leave the latest ultrasonic cleaning to Sonosys.

Ultrasonic Cleaning Spray Nozzle For non-contact single substrate cleaning, we offer a megasonic nozzle with either a single nozzle, dual nozzle, or triple channel, and any combination of frequencies ranging from 600kHz to a maximum of 9MHz. The transducer of this megasonic nozzle generates megasonics and sends them through a fluid (such as pure water) to clean the surface of the substrate. Megasonic Immersion Transducer This is a megasonic immersion transducer with frequencies of 400kHz, 600kHz, 1MHz, and 2MHz. A sealed transducer made of stainless steel or plastic (e.g., PP, PVDF, or PFA) is installed at the bottom or side of an existing tank. In addition to standard systems for substrate sizes of 4", 6", and 8", custom immersion transducers are also available. The highly adaptable configuration allows the megasonic system to be used in bath-tank cleaning processes, improving cost-effectiveness. Frequencies available are 400kHz, 600kHz, 1MHz, and 2MHz.

Company：ティックコーポレーション本社
Price：Other

Ultrasonic Cleaner
Ultrasonic Oscillator
Other cleaning machines
Megasonic Cleaner

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Ultrasonic Megasonic Cleaning Device for Optical Applications

For precise cleaning of prisms. Sonosys ultrasonic cleaning device.

In the optical industry, precise cleaning that affects the quality of prisms is essential. In particular, the removal of fine dust and oil films can impact light transmittance and refractive index, potentially degrading product performance. Our ultrasonic megasonic cleaning equipment thoroughly removes fine dirt adhered to the surface of prisms using megasonic power, contributing to the production of high-quality products. [Application Scenarios] - Cleaning in the prism manufacturing process - Cleaning of optical lenses - Cleaning of precision parts [Benefits of Implementation] - Improved product quality with high cleaning power - Reduced cleaning time - Lower cleaning costs

Company：ティックコーポレーション本社
Price：Other

Ultrasonic Cleaner
Ultrasonic Oscillator
Photomask
Megasonic Cleaner

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Ultrasonic Megasonic Cleaning Equipment for Semiconductor Wafers

Thorough removal of fine contaminants from wafers. High-quality cleaning achieved by Sonosys.

In the semiconductor industry, particularly in wafer manufacturing, the removal of fine contaminants is a critical issue that affects product quality. Fine particles and organic substances adhering to the wafer surface can lead to decreased device performance and lower yields. Our ultrasonic megasonic cleaning equipment effectively removes these contaminants from the wafer surface using megasonic technology. This supports the production of high-quality semiconductor products. 【Usage Scenarios】 - Cleaning in the wafer manufacturing process - Removal of fine contaminants and organic substances - Production of high-quality semiconductor products 【Benefits of Implementation】 - Improved cleaning quality - Enhanced yield - Increased product reliability